کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9670630 | 1450404 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Novel electron beam resist material using hydrophilic protecting group
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
We discuss a new EB resist material that has an alicyclic (bulky) acetal protecting group, with a hydrophilic group in its chemical structure. We synthesized it by acid catalyzed reaction of poly(hydroxystyrene, PHS) with hyper lactonyl adamantyl vinyl ether (HPVE). AFM analysis showed that the resist composed of HPVE polymer exhibits a uniform dissolution property. And the etching durability was double that of poly(methyl methacrylate) and better than that of ethoxy ethyl-protected PHS. EB resist composed of this material provides 60 nm-L/S patterns at less than 8 μC/cm2 with a 50 kV EB exposure system.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volumes 78â79, March 2005, Pages 528-532
Journal: Microelectronic Engineering - Volumes 78â79, March 2005, Pages 528-532
نویسندگان
Satoshi Saito, Tetsuro Nakasugi,