کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1666310 | 1518070 | 2013 | 6 صفحه PDF | دانلود رایگان |

Noria derivatives with pendant methoxy and adamantyl ester moieties (noriaMP-ADn) were synthesized by the substitution reaction of noria analogues with 12 methoxy groups (noriaMP) and 2-bromoacetyloxy-2-methyladamantane (BMA), and their degrees of introduction of adamantyl ester moieties (DI) could be controlled by the feed ratios of noriaMP and BMA. The physical properties such as solubility, film-forming ability, and thermal stability of noriaMP-ADn were also examined to assess the suitability for application as extreme ultraviolet (EUV)-resist materials. The patterning property of noriaMP-AD18 (DI = 18) and noriaMP-AD54 (DI = 54) was investigated in an EUV-resist system, and noriaMP-AD18 yielded higher resolution than noriaMP-AD54, providing a clear line and space pattern with a resolution of 32 nm and a line-width roughness of 10.5 nm by exposure dose of 9.0 mJ/cm2.
► Noria derivatives with pendant methoxy and adamantate moieties were synthesized.
► The physical properties were differences in the values of adamantyl ester moieties.
► The sensitivity was efficient in extreme ultraviolet resist system.
► Resist pattern of 32 nm could be obtained in extreme ultraviolet resist system.
Journal: Thin Solid Films - Volume 534, 1 May 2013, Pages 459–464