Electron beam lithography of hybrid sol–gel negative resist

The direct pattering process here described is proposed as an alternative to conventional multi step nanofabrication techniques, merging materials with novel functional properties and the simplification of the fabrication processes. We report the use of an innovative hybrid sol–gel material working as negative resists for EBL lithography and showing a resolution better than 100 nm. Tailoring the optical and mechanical properties, few examples of photonic nanostructure were fabricated with a simple e-beam exposure that greatly simplify the nanofabrication process.