Surface oxidation and thin film preparation of AlCuFe quasicrystals

This paper reviews the work carried out over the last decade by the Nancy team on surface oxidation and thin film preparation of AlCuFe icosahedral quasicrystals. After discussing the problems linked with the surfaces of these quasicrystals, this review addresses the issue of the preparation of quasicrystalline surfaces and the first steps of oxidation under very low pressure of oxygen. This paper compares the nucleation and growth of oxide on i-AlCuFe quasicrystal and on a classical crystalline phase of this alloy: ω-AlCuFe. Aluminium diffusion is studied through the aluminium segregation on the surface that occurs during exposure to oxygen. Some surface properties of quasicrystals are reviewed with regard to oxidation. The evolution of physical parameters such as surface energy, friction coefficient and optical emissivity is described. This review also deals with the preparation of i-AlCuFe thin films. Two protocols to make i-AlCuFe thin films with free surfaces are described and discussed. The mechanical resistance and the tribological behaviour of these thin films, the oxygen and carbon influence on the final crystalline structure, and the quasicrystallization kinetics are presented.