کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
542524 1450356 2014 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Defect assessment and leakage control in Ge junctions
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Defect assessment and leakage control in Ge junctions
چکیده انگلیسی


• The impact of electrically active defects on the electrical characteristics of Ge in STI Si diodes has been investigated.
• The presence of threading dislocations and associated deep acceptors has a marked impact on the electrical characteristics.
• The DLTS response is related to electron repulsive centers located at ∼0.33–0.40 eV below the conduction band.

In this work, the temperature behavior of the transport mechanisms present in Ge p+n junctions selectively grown in shallow trench isolation (STI) substrates is investigated. Special attention is given to the impact of electrically active defects on the current–voltage (I–V) and capacitance–voltage (C–V) characteristics. Moreover, deep level transient spectroscopy (DLTS) is performed in order to evaluate the electrical properties of the traps. The results show that the presence of threading dislocations and associated deep acceptors has a marked impact on the electrical characteristics. The DLTS response seems to be related to electron repulsive centers with an acceptor character located at ∼0.33–0.40 eV below the conduction band. This mid-gap position yields very effective Shockley–Read–Hall centers and can explain the generation lifetime reduction and leakage increase observed in non-annealed Ge in STI Si diodes.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 125, 1 August 2014, Pages 33–37
نویسندگان
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