کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5432829 | 1508908 | 2017 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Atomically-thin WO3/TiO2 heterojunction for supercapacitor electrodes developed by atomic layer deposition Atomically-thin WO3/TiO2 heterojunction for supercapacitor electrodes developed by atomic layer deposition](/preview/png/5432829.png)
- 2D WO3/TiO2 heterojunction was first demonstrated for supercapacitor electrodes.
- WO3/TiO2 heterojunction has a uniform thickness of ~ 12Â nm with rough surface.
- Specific capacitance of 625.53Â FÂ g-1 and retention of 97.98% were achieved.
- This work represents a general fabrication approach of 2D large-scale electrodes.
In this study two-dimensional (2D) WO3/TiO2 heterojunction developed by atomic layer deposition (ALD) technique has been demonstrated for the first time for supercapacitor (SC) electrodes. This 2D heterojunction has a uniform thickness of ~ 12Â nm with relatively rough surface. The electrode based on WO3/TiO2 heterojunction shown excellent super-capacitive behaviors with high specific capacitance up to 625.53Â FÂ g-1 at the current density of 1Â AÂ g-1 and long-term stability of 97.98% over 2000 cycles. The present work could represent the general approach towards the large-scale fabrication of 2D heterojunction electrodes for high-performance SCs.
Journal: Composites Communications - Volume 5, September 2017, Pages 31-35