کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
543719 | 1450396 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs](/preview/png/543719.png)
چکیده انگلیسی
A projection mask-less patterning (PMLP) proof-of-concept tool, realised as part of the European FP6-NMP integrated project CHARPAN (Charged Particle Nanotech), has been applied for three-dimensional patterning of a GaAs surface, using a stencil mask with a pre-defined opening distribution. A 10 × 10 matrix of micro-lenses was used as test structure for argon ion multi-beam structuring, while studying the time evolution of the sputtered structures. The kinetic sputtering and re-deposition have been modelled in simulation software, in order to be able to correct for such effects beforehand in the design of datasets to be fed to the future programmable aperture plate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 85, Issues 5–6, May–June 2008, Pages 937–941
Journal: Microelectronic Engineering - Volume 85, Issues 5–6, May–June 2008, Pages 937–941
نویسندگان
Falco C.M.J.M. van Delft, Christoph Ebm, Emile P. Naburgh, Elmar Platzgummer, Hans Loeschner, Gerhard Gross,