کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
544144 1450325 2016 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Heavy copper wire-bonding on silicon chips with aluminum-passivated Cu bond-pads
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Heavy copper wire-bonding on silicon chips with aluminum-passivated Cu bond-pads
چکیده انگلیسی


• Thin Al-capping of thick electroplated Cu pads prevents Cu oxidation.
• Electroplated Cu pads allow for heavy Cu wire-bonding.
• Oxidized Cu pads prevent heavy Cu wire-bonding.
• Thin Al-capped Cu pads can be directly bonded without de-oxidation.

Thick electroplated Cu bond-pads have recently been shown to allow for heavy Cu wire-bonding on silicon power devices. The Cu surface oxides present on these pads are a major concern for the bonding process and for a sufficiently stable bond formation. They currently have to be removed after the die-attach and prior to wire-bonding. To avoid such removal, the application of a thin Al coating on the Cu bond-pads is investigated for its passivating ability and its suitability for the bonding process.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 156, 20 April 2016, Pages 41–45
نویسندگان
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