Fabrication of antireflection structure with antifouling-effect surface by ultraviolet nanoimprint lithography

• We fabricated the self-supporting AR structure film with antifouling effect.
• Photo-curable resin with antifouling function was used for UV-NIL.
• The master AR structure mold was made by the oxygen ion beam irradiation method and the transferred by UV-NIL.
• As a result, reflectance of 3% was obtained by the self-supporting AR structure film with antifouling effect.

Ultraviolet nanoimprint lithography (UV-NIL) is a powerful tool for nanofabrication and has several important advantages. For example, as a room-temperature process, UV-NIL enables rapid and high throughput pattern transfer. Since UV-NIL is a low-pressure process, mold damage is negligible and brittle molds can be used for pattern replication. Nanoscale high-density polymer patterns are very useful for antireflection (AR) structures. Recently, the demand has grown for an antireflection and antifouling film surface for touch panels and mobile phone surfaces. In order to fabricate an AR and antifouling film surface, a moth-eye structure was transferred by UV-NIL to photo-curable resin, which has an antifouling effect. As a result, an AR structure with antifouling-effect film was transferred by UV-NIL.

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