کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
544442 1450392 2012 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Growth and optical characteristics of Mg-doped GaAs epitaxial layers by molecular beam epitaxy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Growth and optical characteristics of Mg-doped GaAs epitaxial layers by molecular beam epitaxy
چکیده انگلیسی

Photoluminescence (PL) measurement is used to study the optical properties of Mg-doped GaAs epitaxial layers grown by molecular beam epitaxy (MBE) with various growth temperatures. Four dominant PL peaks are observed, which may be associated with free-to-bound (e–A), exciton-bound to neutral acceptor (AoX), and two kinds of acceptor associated (g, g–g) transitions. The g and g–g peaks are especially prominent in a sample with a carrier concentration of 2.3 × 1017 cm−3. To investigate the behavior of each peak as a function of temperature, PL measurements were carried out over a temperature range of 18–152 K. The AoX peak position follows the Varshni model for GaAs with increasing temperature. For the g and AoX peaks, we observe an increase in PL intensity with increasing temperature from 18 to 28 K. This phenomenon is known as “negative thermal quenching (NTQ)”, and it is observed in the g peak for the first time in this paper.

Figure optionsDownload as PowerPoint slideHighlights
► Four photoluminescence peaks are observed in Mg-doped GaAs.
► The temperature dependent PL intensities for the four peaks are investigated.
► The PL intensities of the acceptor related peak (g) and the transition of an exciton bound to neutral acceptor peaks show negative thermal quenching.
► This phenomenon was occurred by the other peaks’ dissociation and carriers’ trapping.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 89, January 2012, Pages 6–9
نویسندگان
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