کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
544562 871770 2011 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Evaluating k-values for low-k materials after damascene integration: Method and results
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Evaluating k-values for low-k materials after damascene integration: Method and results
چکیده انگلیسی

This work discusses a method for measuring k-values of low-k films after integration in damascene structures. The experimental results are obtained from 90 nm ½ pitch single damascene structures on low-k materials with intrinsic k-values ranging between 2.2 and 3. The measurement technique is discussed in detail with a focus on the accuracy, limitation of the method, impact of low-k damage and applicability for smaller dimensions.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 88, Issue 5, May 2011, Pages 651–655
نویسندگان
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