کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6613086 | 459593 | 2014 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
In-situ Microstructural Investigations by Electron-beam Irradiation Induced Crystallization of Amorphous MoOx Thin Films with High Performance for Li-ion Storage
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Amorphous MoOx (a-MoOx, 2 < x < 3) thin films were deposited by a reactive magnetron sputtering method. As the Li-ion storage electrodes, the a-MoOx thin films exhibit a high capacity of 338 μAh·cmâ2 (about 845 mAh·gâ1) at a current density of 90 μA cmâ2 even after 100 electrochemical cycles, and have a rate capacity of 158 μAh cmâ2 at a high current density of 2000 μA cmâ2. The phase analysis revealed that all the a-MoOx thin films maintained an amorphous characteristic after having been charged-discharged at various stages. In-situ electron-beam irradiation (EBI) induced crystallization of the a-MoOx thin films was performed by using a transmission electron microscopy. By analyzing the EBI induced crystalline phases of the a-MoOx thin films, the possible electrochemical reactions during the charge-discharge processes were discussed. According to the developed investigation method, the possible electrochemical mechanism in the a-MoOx thin films were proposed to undergo a conversion reaction such as MoOx + 2xLi+ + 2xeâ â Mo + xLi2O during the electrochemical processes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 144, 20 October 2014, Pages 369-375
Journal: Electrochimica Acta - Volume 144, 20 October 2014, Pages 369-375
نویسندگان
Wenhao Chen, Hong Zhang, Ying Wang, Zhiyuan Ma, Zhicheng Li,