Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 193, 5 June 2018, Pages 18-22

Andrea Cattoni, Dominique Mailly, Olivier Dalstein, Marco Faustini, Gediminas Seniutinas, Benedikt Rösner, Christian David,