Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 155, 2 April 2016, Pages 67-73

Stefan Pfirrmann, Anja Voigt, Anett Kolander, Gabi Grützner, Olga Lohse, Irina Harder, Vitaliy A. Guzenko,