Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry

Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 141, 15 June 2015, Pages 68-71

Bruno Lee Sang, Marie-Josée Gour, Abdelatif Jaouad, Serge Ecoffey, Maxime Darnon, Benattou Sadani, Abdelkader Souifi, Dominique Drouin,