Recess Photomask Contact Lithography and the fabrication of coupled silicon photonic and plasmonic waveguide switches

Recess Photomask Contact Lithography and the fabrication of coupled silicon photonic and plasmonic waveguide switches

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 141, 15 June 2015, Pages 129-134

Laurent Markey, Filimon Zacharatos, Jean-Claude Weeber, Andreas Prinzen, Michael Waldow, Michael G. Nielsen, Tolga Tekin, Alain Dereux,