Nanoimprint lithography with a soft roller and focused UV light for flexible substrates

► We implemented a new concept of a UV-RNIL system for flexible substrates. ► Silicone rubber is wrapped around the press roller to control the contact length. ► A focused line beam of UV is illuminated on the contact area to cure the resist. ► We verified the system by simulations and experiments on micro- and nano-patterning. ► The system can be used to produce flexible nanopatterned devices.