کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7118969 | 1461407 | 2015 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Current-voltage and capacitance-voltage characteristics of Al Schottky contacts to strained Si-on-insulator in the wide temperature range
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The electrical characteristics of Al/strained Si-on-insulator (sSOI) Schottky diode have been investigated using current-voltage (I-V) and capacitance-voltage (C-V) measurements in the wide temperature range of 200-400Â K in steps of 25Â K. It was found that the barrier height (0.57-0.80Â eV) calculated from the I-V characteristics increased and the ideality factor (1.97-1.28) decreased with increasing temperature. The barrier heights determined from the C-V measurements were higher than those extracted from the I-V measurements, associated with the formation of an inhomogeneous Schottky barrier at the interface. The series resistance estimated from the forward I-V characteristics using Cheung and Norde methods decreased with increasing temperature, implying its strong temperature dependence. The observed variation in barrier height and ideality factor could be attributed to the inhomogeneities in Schottky barrier, explained by assuming Gaussian distribution of barrier heights. The temperature-dependent I-V characteristics showed a double Gaussian distribution with mean barrier heights of 0.83 and 1.19Â eV and standard deviations of 0.10 and 0.16Â eV at 200-275 and 300-400Â K, respectively. From the modified Richardson plot, the modified Richardson constant were calculated to be 21.8 and 29.4Â AÂ cmâ2Â Kâ2 at 200-275 and 300-400Â K, respectively, which were comparable to the theoretical value for p-type sSOI (31.6Â AÂ cmâ2Â Kâ2).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 390-399
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 390-399
نویسندگان
I. Jyothi, V. Janardhanam, Hyobong Hong, Chel-Jong Choi,