کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7118969 1461407 2015 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Current-voltage and capacitance-voltage characteristics of Al Schottky contacts to strained Si-on-insulator in the wide temperature range
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Current-voltage and capacitance-voltage characteristics of Al Schottky contacts to strained Si-on-insulator in the wide temperature range
چکیده انگلیسی
The electrical characteristics of Al/strained Si-on-insulator (sSOI) Schottky diode have been investigated using current-voltage (I-V) and capacitance-voltage (C-V) measurements in the wide temperature range of 200-400 K in steps of 25 K. It was found that the barrier height (0.57-0.80 eV) calculated from the I-V characteristics increased and the ideality factor (1.97-1.28) decreased with increasing temperature. The barrier heights determined from the C-V measurements were higher than those extracted from the I-V measurements, associated with the formation of an inhomogeneous Schottky barrier at the interface. The series resistance estimated from the forward I-V characteristics using Cheung and Norde methods decreased with increasing temperature, implying its strong temperature dependence. The observed variation in barrier height and ideality factor could be attributed to the inhomogeneities in Schottky barrier, explained by assuming Gaussian distribution of barrier heights. The temperature-dependent I-V characteristics showed a double Gaussian distribution with mean barrier heights of 0.83 and 1.19 eV and standard deviations of 0.10 and 0.16 eV at 200-275 and 300-400 K, respectively. From the modified Richardson plot, the modified Richardson constant were calculated to be 21.8 and 29.4 A cm−2 K−2 at 200-275 and 300-400 K, respectively, which were comparable to the theoretical value for p-type sSOI (31.6 A cm−2 K−2).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 390-399
نویسندگان
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