Material research on the InGaAs-emitting-layer VECSEL grown on GaAs substrate

Wafers of InGaAs-emitting-layer vertical external cavity surface emitting semiconductor laser (VECSEL) gain chip and separate active region were grown on semi-insulator GaAs substrates by low pressure metal–organic vapor phase epitaxy (MOVPE). Photoluminescence (PL) wavelength of the active region could be adjusted linearly about 1 nm for increasing 1 sccm H2 flow rate through TMIn under AsH3 flow rates of 150 sccm. The complicated surface-emitted PL signal of the VECSEL gain chip was strongly modulated by interferences within the multilayer and was interpreted by the aberrance of the quantum wells emission with a profile filtered by a micro-cavity resonance in the longitudinal confinement factor. Material tests of the VECSEL wafer showed the reflectivity of the DBR mirrors was in good agreement with the active region photoluminescence, and the wafer was obtained with high crystal quality.