کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
726678 | 1461425 | 2014 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Analysis on the local structure and its implication on the magnetic properties of Si1âxMnx thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
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چکیده انگلیسی
Si1âxMnx diluted magnetic semiconductor films were deposited on p-type Si(1Â 0Â 0) substrate by radio frequency magnetron sputtering method. Post thermal annealing was performed in an argon atmosphere at 1073Â K for 300Â s and at 1473Â K for 120Â s. The as-grown sample exhibits ferromagnetism at room temperature. Ferromagnetism is enhanced after annealing treatment. High resolution transmission electron microscopy shows that only Mn4Si7 compound formed in all samples. X-ray diffraction patterns and Fast Fourier Transform image indicate Mn atoms incorporated into Si lattice upon annealing. X-ray absorption fine structure suggests the formation of substitutional-tetrahedral interstitial Mn-Mn and tetrahedral interstitial-substitutional-tetrahedral interstitial Mn-Mn-Mn complexes in the 1473Â K annealed sample, which possesses the strongest ferromagnetism.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 21, May 2014, Pages 1-6
Journal: Materials Science in Semiconductor Processing - Volume 21, May 2014, Pages 1-6
نویسندگان
Tiecheng Li, Liping Guo, Congxiao Liu, Jihong Chen, Guoliang Peng, Fengfeng Luo, Zheng Jiang, Yuying Huang,