کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
727079 892681 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Interaction of ion-implantation-induced interstitials in B-doped SiGe
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Interaction of ion-implantation-induced interstitials in B-doped SiGe
چکیده انگلیسی
B-doped Si0.77Ge0.23 of various surface-doping levels was used to investigate the evolution of implant damage and the corresponding transient enhanced diffusion of boron as a function of boron concentration. These layers were implanted with a non-amorphizing 60 keV, 1×1014 cm−2 Si, and annealed at 750 °C. Plan-view transmission electron microscopy (PTEM) confirmed the formation and dissolution of dislocation loops. Transient enhanced diffusion (TED) is evident in the surface doped SiGe, but the low diffusivity of interstitials in Si0.77Ge0.23 and the presence of interstitial traps inhibited TED at the deeper B marker layer.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 10, Issue 1, February 2007, Pages 1-5
نویسندگان
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