Electrical characterization of thiols self-assembled layers on GaP (1 1 1) structures

The experimental studies on III–V semiconductor compounds surface passivation phenomena are mainly dedicated to solve some technological problems as those regarding the ways to keep the chemical stability of native oxides on surfaces. Self-assembled monolayers (SAMs) provide a simple way to produce relatively ordered structures at a molecular scale, which seems to be capable to protect the clean surface against the evolution of oxidation process. In this respect, thin films of SAMs of aliphatic thiol (dodencanthiol—CH3(CH2)11SH) and aromatic thiol (4, 4′ tiobisbenzenthiol-S (C6H4SH)2 have been deposited on the surface of GaP (1 1 1) samples. The electrical properties measurements of some structures based on GaP compound was performed. There were recorded current–voltage (I–V) characteristics for complex structures AuGeNi/R-SH/GaP and AuGeNi/Ar-SH/GaP in darkness and also exposed to a Xe lamp. In dark and in “reverse bias” way, the I–V characteristics present the feature of a Zenner diode for GaP/Ar-SH and a gradual increase of current for GaP/R-SH. In dark and “in forward bias” way, the current increases as for a normal diode for both GaP/Ar-SH and GaP/R-SH structures. The complex structures (e.g.: In/AuGeNi/R-SH/GaP/R-SH/AuGeNi/In) are less sensitive to light. The SEM analysis performed on a GaP/R-SH surface shows a continuous packed up layer while GaP/Ar-SH looks like an inhomogeneous deposition of layers with different thickness regions. The diodes’ ideality factors determined from I–V characteristics are unusually high (n⪢2) as a possible result of inhomogeneous Schottky contacts or due to ageing effects, in the field of degradation.