کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
730021 1461437 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effects of thermal annealing on In-induced metastable defects in InGaN films
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Effects of thermal annealing on In-induced metastable defects in InGaN films
چکیده انگلیسی
We investigated the effects of thermal annealing on the properties of InGaN layers. From secondary ion mass spectroscopy results, it was found that severe In desorption occurred after annealing. Photoluminescence and X-ray diffraction results indicate that significant amounts of In vacancy-related defects exist in the annealing samples. It was also found that persistent photoconductivity decay time constants were 211, 893 and 1040 s, while the decay exponents were 0.153, 0.120 and 0.213 for the as-grown, 800 °C-annealed and 1000 °C-annealed InGaN epitaxial layers, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 10, Issues 2–3, April 2007, Pages 112-116
نویسندگان
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