کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
749819 | 894850 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High power and high breakdown δ-doped In0.35Al0.65As/In0.35Ga0.65As metamorphic HEMT
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: High power and high breakdown δ-doped In0.35Al0.65As/In0.35Ga0.65As metamorphic HEMT High power and high breakdown δ-doped In0.35Al0.65As/In0.35Ga0.65As metamorphic HEMT](/preview/png/749819.png)
چکیده انگلیسی
δ-Doped In0.35Al0.65As/In0.35Ga0.65As metamorphic high electron mobility transistor (MHEMT) grown by molecular beam epitaxy (MBE) has been successfully investigated. High power characteristic are achieved due to the improved impact ionization and kink effects within the channel by bandgap engineering. This work demonstrates distinguished device characteristics, including superior breakdown performance (BVGD = −15.2 V and BVoff = 14.1 V), high small-signal gain (Gs = 22.7 dB), high microwave output power (Pout = 14.1 dB m at 2.4 GHz), and low minimum noise figure (NFmin = 1.1 dB). In addition, complete parametric information of the small-signal device model has also been extracted and discussed for the studied metamorphic HEMT.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 50, Issue 2, February 2006, Pages 291–296
Journal: Solid-State Electronics - Volume 50, Issue 2, February 2006, Pages 291–296
نویسندگان
Shu-Jenn Yu, Wei-Chou Hsu, Yeong-Jia Chen, Chang-Luen Wu,