کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7690812 | 1495963 | 2018 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Thermal effect on microstructure vibration of SiO2 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی آنالیزی یا شیمی تجزیه
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Thermal effect on microstructure vibration of SiO2 thin films Thermal effect on microstructure vibration of SiO2 thin films](/preview/png/7690812.png)
چکیده انگلیسی
The microstructure of amorphous SiO2 thin film is a random network structure in which a large amount of [SiO4] is interconnected with a specific SiOSi bond angle. The SiO2 thin films used in this paper were prepared by ion beam sputtering and electron beam evaporation deposition techniques. Two-dimensional correlation spectroscopy analysis techniques were used in this study. By measuring the infrared temperature spectrum, we obtained the two-dimensional correlation synchronous spectrum and asynchronous spectrum, and decomposed the in-phase and out-phase asymmetric stretching vibration characteristics of SiOSi. As the temperature increases, the spectral transmittance of the vibrating peak decreases, and the relative change of in-phase asymmetric stretching vibration absorption peak is higher than that of the out-phase asymmetric stretching vibration absorption peak.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vibrational Spectroscopy - Volume 96, May 2018, Pages 101-105
Journal: Vibrational Spectroscopy - Volume 96, May 2018, Pages 101-105
نویسندگان
Huasong Liu, Yugang Jiang, Dandan Liu, Shida Li, Xiao Yang, Yiqin Ji, Yuping Cui,