A study of the electrochemical performance of vanadium oxide thin films grown by atmospheric pressure chemical vapour deposition

Thin films of vanadium oxide were deposited on glass substrates at 450 oC by atmospheric pressure chemical vapour deposition. The effect of the vanadium tetrachloride to water precursor ratio on the structural and morphological properties of the films was investigated. The water concentration was observed to strongly affect the vanadium oxidation state and the morphological characteristics of the films. The importance of achieving single-phase of a particular oxidation state towards the improvement of the electrochemical performance of thin films grown by atmospheric pressure CVD is highlighted.

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► Single-phase V2O5 and VO2 were deposited using atmospheric pressure CVD (APCVD).
► Vanadium oxidation state strongly depends on the water concentration.
► Electrochemical performance is faster and more efficient with V2O5.
► APCVD V2O5 is electrochromic.