کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7882852 | 1509617 | 2012 | 12 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Achieving maximum hardness in semi-coherent multilayer thin films with unequal layer thickness
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Sources of plastic strengthening in [0Â 0Â 1] epitaxial Cu/Ni multilayer thin films are examined using measurements of in-plane lattice parameter and hardness (H) for films of different bilayer period (Î) and Ni volume fraction (% Ni). Similar to other investigations, H for 50% Ni-50% Cu films increases with decreasing bilayer period down to ÎÂ =Â 20Â nm, where interfaces are coherent. A new finding is that H for semi-coherent films increases with % Ni. This strategy yields the largest reported H for this system (5.2Â GPa for 60% Ni/40% Cu, ÎÂ =Â 60Â nm), showing that smaller is not always stronger. The rationale for the increased H is the development of a large interfacial dislocation density during the elasto-plastic transition to fully plastic yield. This strengthens Cu/Ni interfaces to slip propagation. The results are interpreted with a dislocation-based model that furnishes estimates of interfacial dislocation line energies, pinning strengths to confined layer slip, and interface barrier strengths to slip transmission.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Acta Materialia - Volume 60, Issues 6â7, April 2012, Pages 2625-2636
Journal: Acta Materialia - Volume 60, Issues 6â7, April 2012, Pages 2625-2636
نویسندگان
John S. Carpenter, Amit Misra, Peter M. Anderson,