Matching in-situ and ex-situ recorded stress gradients in an AlxGa1 − xN Heterostructure: Complementary wafer curvature analyses in time and space

Matching in-situ and ex-situ recorded stress gradients in an AlxGa1 − xN Heterostructure: Complementary wafer curvature analyses in time and space

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 147, 1 April 2018, Pages 50-54

M. Reisinger, C. Ostermaier, M. Tomberger, J. Zechner, B. Sartory, W. Ecker, I. Daumiller, J. Keckes,