کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
80959 | 49412 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Analysis of semiconductor thin films deposited using a hollow cathode plasma torch
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
کاتالیزور
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The hollow cathode plasma torch has been used for several years. One of the major applications has been the deposition of dielectric thin films. However, this technique has also been used to deposit metals where high-speed deposition is needed. It has proven to be useful in deposition of coatings onto the inside of substrates of complex shape, high-speed etching, and deposition of thin films at atmospheric pressure. In recent years, we have adapted the technique to deposit high-quality amorphous and polycrystalline semiconducting films. A large variety of measurement techniques have been employed to determine the film properties and the results are reported here.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 91, Issues 15–16, 22 September 2007, Pages 1383–1387
Journal: Solar Energy Materials and Solar Cells - Volume 91, Issues 15–16, 22 September 2007, Pages 1383–1387
نویسندگان
R.J. Soukup, N.J. Ianno, J.L. Huguenin-Love,