کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8149652 | 1524404 | 2015 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth variations and scattering mechanisms in metamorphic In0.75Ga0.25As/In0.75 Al0.25As quantum wells grown by molecular beam epitaxy
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
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چکیده انگلیسی
Modulation doped metamorphic In0.75Ga0.25As/In0.75Al0.25As quantum wells (QW) were grown on GaAs substrates by molecular beam epitaxy (MBE) with step-graded buffer layers. The electron mobility of the QWs has been improved by varying the MBE growth conditions, including substrate temperature, arsenic over pressure and modulation doping level. By applying a bias voltage to SiO2 insulated gates, the electron density in the QW can be tuned from 1Ã1011 to 5.3Ã1011Â cmâ2. A peak mobility of 4.3Ã105Â cm2Vâ1sâ1 is obtained at 3.7Ã1011Â cmâ2 at 1.5Â K before the onset of second subband population. To understand the evolution of mobility, transport data is fitted to a model that takes into account scattering from background impurities, modulation doping, alloy disorder and interface roughness. According to the fits, scattering from background impurities is dominant while that from alloy disorder becomes more significant at high carrier density.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 425, 1 September 2015, Pages 70-75
Journal: Journal of Crystal Growth - Volume 425, 1 September 2015, Pages 70-75
نویسندگان
Chong Chen, Ian Farrer, Stuart N. Holmes, Francois Sfigakis, Marc P. Fletcher, Harvey E. Beere, David A. Ritchie,