کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9670373 | 1450401 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Modeling of residual stresses in thin films deposited by electron beam evaporation
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
The modeling of residual stresses generally deals with the calculation of the thermal ones alone. In the present work, a model is proposed, where intrinsic residual stresses are calculated explicitly. It is based on the Tsui-Clyne model, which was modified in order to describe the deposition of n different deposited layers on the substrate with the same set of equations as in a mono-layer system. For that we introduced the notion of “virtual substrate” and “effective parameters”. The calculated values are compared with experimental results obtained for the following systems: Ta/Si, Mo/Si, Al/SiOx/Si and Pd/SiOx/Si. The depositions were performed by electron beam evaporation onto Si and Si/SiOx (1Â 0Â 0) substrates with varying film thickness.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 82, Issues 3â4, December 2005, Pages 665-669
Journal: Microelectronic Engineering - Volume 82, Issues 3â4, December 2005, Pages 665-669
نویسندگان
G. Guisbiers, S. Strehle, M. Wautelet,