کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9791126 1513259 2005 11 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
MOCVD of pure and Ga-doped epitaxial ZnO
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
MOCVD of pure and Ga-doped epitaxial ZnO
چکیده انگلیسی
The films on (111) ZrO2(Y 2O3), (111) SrTiO3, are characterized by a higher epitaxial quality than films on sapphire traditionally used for ZnO epitaxy. This results in the higher solubility of Ga2O3 in ZnO films on (111) ZrO2(Y 2O3) (at least up to 7.5 at.% Ga in the sum of Ga and Zn) as compared to the films on r-Al2O3 (below 3 at.% Ga) due to the epitaxial stabilization. The intensity of the UV photoluminescence (PL) correlates with the epitaxial quality of ZnO films. Ga-doping resulted in the quenching of green PL band because of Ga3+ occupancy of the octahedral interstitials in the ZnO structure (in agreement with the variation of the ZnO(Ga2O3) lattice parameters).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 38, Issues 4–6, October–December 2005, Pages 272-282
نویسندگان
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