Keywords: مواد با کیفیت بالا; Ion beam analysis; High resolution depth profiling; ERD; High-k materials
مقالات ISI مواد با کیفیت بالا (ترجمه نشده)
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در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
FET-based radiation sensors with Er2O3 gate dielectric
Keywords: مواد با کیفیت بالا; Erbium oxide (Er2O3); High-k materials; Irradiation effects; Gamma-ray; Charge trapping; pMOS dosimeters;
Polymorphous GdScO3 as high permittivity dielectric
Keywords: مواد با کیفیت بالا; Thin oxide films; Epitaxial growth; High-k materials;
Magnetic nanoparticles induced dielectric enhancement in (La, Gd)2O3: SiO2 composite systems
Keywords: مواد با کیفیت بالا; Rare earth oxide nanoparticle; High-k materials; Magnetodielectric effect; Diffuse phase transition;
Precursors as enablers of ALD technology: Contributions from University of Helsinki
Keywords: مواد با کیفیت بالا; acac; acetylacetonate; ALD; atomic layer deposition; CET; capacitance equivalent thickness; CHT; cycloheptatrienyl; CHD; cyclohexadiene; CMOS; complementary metal oxide semiconductor; CN; coordination number; Cp; cyclopentadienide; COD; cyclooctadiene; CV
Ellipsometric investigation of the mechanism of the formation of titanium oxynitride nanolayers
Keywords: مواد با کیفیت بالا; Nitrides; High-k materials; Optical properties; Thin films; Spectroscopic ellipsometry
Development of hafnium based high-k materials-A review
Keywords: مواد با کیفیت بالا; Hafnium; Thin films; High-k materials;
Characterization of the annealing impact on La2O3/HfO2 and HfO2/La2O3 stacks for MOS applications
Keywords: مواد با کیفیت بالا; High-K materials; Lanthanum oxide; Thermal annealing; Dissolution
Understanding the potential and limitations of HfAlO as interpoly dielectric in floating-gate Flash memory
Keywords: مواد با کیفیت بالا; HfAlO; High-k materials; Defect density; Interpoly dielectrics; Flash memory; NAND
Composition of alumina films grown on Si at low temperature with catalytic CVD
Keywords: مواد با کیفیت بالا; Al2O3; High-k MOS gates; High-k materials; Catalytic CVD; Oxide films; Insulator gates;
Performance and reliability of HfAlOx-based interpoly dielectrics for floating-gate Flash memory
Keywords: مواد با کیفیت بالا; Flash memory; Floating gate; Interpoly dielectrics; High-k materials; Metal gate; Degas; Hafnium aluminate; HfAlOx
Praseodymium compound formation in silicon by ion beam synthesis
Keywords: مواد با کیفیت بالا; Ion implantation; Ion beam synthesis; Compound formation; High-k materials; Pr; Si;
Structural and electronic analysis of Hf on Si(1Â 1Â 1) surface studied by XPS, LEED and XPD
Keywords: مواد با کیفیت بالا; High-k materials; Silicon; Surface; XPD;
Ion backscattering study of ultra-thin oxides: Al2O3 and AlHfOx films on Si
Keywords: مواد با کیفیت بالا; 78.30.Am; 82.80.Yc; 85.30.Tv; 61.85.+p; Rutherford backscattering spectroscopy (RBS); Channeling; Semiconductor devices; Ultra-thin insulator; High-k materials; Aluminum oxide; Hafnium oxide; Atomic layer deposition (ALD);
Low voltage and low power embedded 2T-SONOS flash memories improved by using P-type devices and high-K materials
Keywords: مواد با کیفیت بالا; SONOS; Flash; Low power; Non-volatile memory; High-K materials; HfO2; HfSiON; Reliability;