کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10248686 | 49323 | 2014 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
کاتالیزور
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature](/preview/png/10248686.png)
چکیده انگلیسی
In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4-PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66% between colored and bleached state, at 630 nm, with a color efficiency of 55 cm2 Câ1. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cmâ2 and 1.4 s cmâ2, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 120, Part A, January 2014, Pages 109-115
Journal: Solar Energy Materials and Solar Cells - Volume 120, Part A, January 2014, Pages 109-115
نویسندگان
Sónia Pereira, Alexandra Gonçalves, Nuno Correia, Joana Pinto, LuÃs Pereira, Rodrigo Martins, Elvira Fortunato,