کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10248686 | 49323 | 2014 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
کاتالیزور
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4-PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66% between colored and bleached state, at 630 nm, with a color efficiency of 55 cm2 Câ1. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cmâ2 and 1.4 s cmâ2, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 120, Part A, January 2014, Pages 109-115
Journal: Solar Energy Materials and Solar Cells - Volume 120, Part A, January 2014, Pages 109-115
نویسندگان
Sónia Pereira, Alexandra Gonçalves, Nuno Correia, Joana Pinto, LuÃs Pereira, Rodrigo Martins, Elvira Fortunato,