کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1447365 | 988642 | 2011 | 10 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Microstructure and elastic properties of atomic layer deposited TiO2 anatase thin films Microstructure and elastic properties of atomic layer deposited TiO2 anatase thin films](/preview/png/1447365.png)
Amorphous TiO2 thin films were deposited by means of atomic layer deposition on Kapton substrates and then crystallized ex situ by annealing at 300 °C to obtain the anatase phase. The morphology, structure and microstructure of films treated for 12, 24, 72 and 90 h were investigated. The local Ti coordination changes were studied by X-ray near-edge structure (XANES).On the basis of X-ray diffraction residual stress calculations, the elastic anisotropy of the films is experimentally determined for the first time (Acomp∗=0.07, Ashear∗=0.03). The film macro-strains increased with the time of treatment, while the micro-strains decreased. This effect may be correlated with the incipient anatase-to-rutile transformation as suggested by the changes observed in the XANES pattern of the film treated for 90 h. However, the contribution of the substrate cannot be excluded.
Journal: Acta Materialia - Volume 59, Issue 7, April 2011, Pages 2891–2900