Size effects on yield strength and strain hardening for ultra-thin Cu films with and without passivation: A study by synchrotron and bulge test techniques

We present a systematic study of the mechanical properties of different Cu, Ta/Cu and Ta/Cu/Ta films systems. By using a novel synchrotron-based tensile testing technique isothermal stress–strain curves for films as thin as 20 nm were obtained for the first time. In addition, freestanding Cu films with a minimum thickness of 80 nm were tested by a bulge testing technique. The effects of different surface and interface conditions, film thickness and grain size were investigated over a range of film thickness up to 1 μm. It is found that the plastic response scales strongly with film thickness but the effect of the interfacial structure is smaller than expected. By considering the complete grain size distribution and a change in deformation mechanism from full to partial dislocations in the smallest grains, the scaling behavior of all film systems can be described correctly by a modified dislocation source model. The nucleation of dissociated dislocations at the grain boundaries also explains the strongly reduced strain hardening for these films.