Hydrofluoric acid free synthesis of macropores on silicon by chemical vapor deposition and their photoluminescence

A novel hydrofluoric acid (HF) free atmospheric pressure chemical vapor deposition (APCVD) method has been developed to synthesize macropores on silicon. Field emission scanning electron microscopy (FESEM), X-ray powder diffraction (XRD) and energy-dispersive X-ray (EDX) spectrum indicate that the composition of macropores with the diameters of several hundred nanometers is silica. Moreover, the mechanism of the formation of the macropores has been preliminarily discussed. The photoluminescence (PL) spectrum of the macropores shows a broad violet emission band with the peak position at 402 nm, which is related with the defects of silica.