Temperature sensitivity analysis of polarity controlled electrostatically doped tunnel field-effect transistor

• Temperature sensitivity analysis of a polarity controlled electrostatically doped tunnel field-effect transistor (ED-TFET) is investigated in this paper.
• Different performance metrics and analog/RF figure-of-merits were analysed for both conventional and proposed devices.
• ATLAS device simulation shows variation in ON-state current in ED-TFET is almost temperature independent due to electrostatically doped mechanism.
• Above room temperature, the ION, IOFF, and SS of ED-TFET are less sensitive towards temperature variation as compared to the conventional TFET.

The conventional tunnel field-effect transistors (TFETs) have shown potential to scale down in sub-22 nm regime due to its lower sub-threshold slope and robustness against short-channel effects (SCEs), however, sensitivity towards temperature variation is a major concern. Therefore, for the first time, we investigate temperature sensitivity analysis of a polarity controlled electrostatically doped tunnel field-effect transistor (ED-TFET). Different performance metrics and analog/RF figure-of-merits were considered and compared for both devices, and simulations were performed using Silvaco ATLAS device tool. We found that the variation in ON-state current in ED-TFET is almost temperature independent due to electrostatically doped mechanism, while, it increases in conventional TFET at higher temperature. Above room temperature, the variation in ION, IOFF, and SS sensitivity in ED-TFET are only 0.11%/K, 2.21%/K, and 0.63%/K, while, in conventional TFET the variations are 0.43%/K, 2.99%/K, and 0.71%/K, respectively. However, below room temperature, the variation in ED-TFET ION is 0.195%/K compared to 0.27%/K of conventional TFET. Moreover, it is analysed that the incomplete ionization effect in conventional TFET severely affects the drive current and the threshold voltage, while, ED-TFET remains unaffected. Hence, the proposed ED-TFET is less sensitive towards temperature variation and can be used for cryogenics as well as for high temperature applications.