کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1552783 | 1513211 | 2016 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
200-V High-side thick-layer SOI field p-channel LDMOS with multiple field plates
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
A high-voltage thick layer SOI field p-channel LDMOS (pLDMOS) with multiple field plates based on 11-μm-thick silicon layer and 1-μm-thick buried oxide layer is presented in this paper. The thick gate oxide layer is formed by field oxide process to endure the high voltage between the source and gate electrodes. The field implant (FI) technology is adopted to eliminate channel discontinuity at the bird's beak region. Multiple field plates constructed by polysilicon and metal layer are adopted to modulate electric field distribution of the depleted drift region. The SOI field pLDMOS with off-state breakdown voltage (BV) of â240 V is experimentally realized, which can be widely used for simplifying the design of level shifting.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 90, February 2016, Pages 141-147
Journal: Superlattices and Microstructures - Volume 90, February 2016, Pages 141-147
نویسندگان
Tao Liang, Liwen Ding, Gang Chen, Yitao He, Yong Huang, Ming Qiao, Bo Zhang,