Vapour phase transport growth of ZnO layers and nanostructures

We have developed a novel advanced VPT set-up. ZnO layers and nanorods were grown employing a specially designed horizontal vapour transport system with elemental sources at relatively low temperatures without catalysis. We employed 6N elemental Zn carried by nitrogen and 99.995% oxygen as reactants. Sapphire, SiC, bulk ZnO and ZnO epitaxial layers were implemented as substrates for ZnO growth. Growth temperatures ranged from 500 to 900 ∘C. Reactor pressures were from 5 mbar to atmospheric pressure. We employed x-ray diffractometry, optical microscopy, scanning electron microscopy and atomic force microscopy to investigate the obtained ZnO samples and the influence of different growth parameters on the ZnO homo- and heteroepitaxial growth and to optimise the set of growth parameters either for both epitaxial layers and nanostructures. We also show that the quality of the VPT grown ZnO epitaxial layers on sapphire can be even higher (evaluated from FWHM of the XRD rocking curves) than the MBE grown ones used as epiwafers for VPT growth. High quality ZnO layers with extremely narrow FWHM of the (0002) rocking curve of 38″ are fabricated employing our VPT approach.