کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662296 | 1517696 | 2007 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Thermal stability studies for advanced Hafnium and Zirconium ALD precursors
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Thermal stability studies for advanced Hafnium and Zirconium ALD precursors Thermal stability studies for advanced Hafnium and Zirconium ALD precursors](/preview/png/1662296.png)
چکیده انگلیسی
The use of thermogravimetric analysis (TGA) to determine evaporation rates under a variety of conditions is employed to determine initial temperature regimes where decomposition may occur. More detailed studies using Nuclear Magnetic Resonance (NMR) are then conducted at fixed temperatures over a prolonged time period with regular monitoring to establish degradation effects more accurately. Our studies show similar trends between both Hf and Zr materials with the Zr derivatives less stable in all cases. Operation temperatures required to achieve suitable vapour transport in the case of MeCp2ZrMe2 have been found to lead to catastrophic decomposition after a relatively short time thus negating the usefulness of this precursor in a production environment. All other sources were deemed safe to employ under standard process conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issues 22â23, 25 September 2007, Pages 9060-9065
Journal: Surface and Coatings Technology - Volume 201, Issues 22â23, 25 September 2007, Pages 9060-9065
نویسندگان
Simon Rushworth, Kathleen Coward, Hywel Davies, Peter Heys, Thomas Leese, Louis Kempster, Rajesh Odedra, Fuquan Song, Paul Williams,