کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1790172 1524418 2015 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Applicability of the three-dimensional Alexander-Haasen model for the analysis of dislocation distributions in single-crystal silicon
ترجمه فارسی عنوان
کاربرد مدل سه بعدی الکساندر هاآسن برای تحلیل توزیع های جابجایی در سیلیکون تک کریستال
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
چکیده انگلیسی
Applicability of the three-dimensional Alexander-Haasen (AH) model for the analysis of dislocation distributions in single-crystal silicon has been estimated. The numerical results obtained from the AH model agree well with the experimental data for both CZ-Si and FZ-Si crystals with the axis in the [001] direction but do not completely agree with the experimental data for the FZ-Si crystal with the axis in the [111] direction. The inapplicability of the AH model in a crystal with the axis in the [111] direction may arise from the neglect of dislocation propagation in this model, because the dislocation propagation in a crystal with the axis in the [111] direction is more active than that in a crystal with the axis in the [001] direction. Therefore, to increase the applicability of the AH model, it is necessary to include the effect of dislocation propagation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 411, 1 February 2015, Pages 49-55
نویسندگان
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