کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1793215 | 1023669 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Metalorganic vapor-phase epitaxy of GaN layers on Si substrates with Si(1Â 1Â 0) and other high-index surfaces
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We report on the influence of different surface orientations of Si substrates on the properties of GaN-based layer structures grown by metalorganic vapor-phase epitaxy. By using a high-temperature AlN seed layer, a monocrystalline and c-axis-oriented GaN-layer can be obtained on all substrates with Si(1Â 1Â 0), Si(1Â 1Â 1), Si(1Â 1Â 5), Si(1Â 1Â 7), and Si(1Â 1Â 9) surface planes. In particular, the samples on Si(1Â 1Â 0) substrates exhibit a high quality of the GaN layer, which is comparable or even better than that of identically grown test structures on standard Si(1Â 1Â 1) substrates. This result can be explained by a more suited epitaxial relation between the c-plane of the high-temperature AlN seed layer and the Si(1Â 1Â 0) surface. The crystallographic structure of approximately 500-nm-thick GaN layers on Si(1Â 1Â 0) and Si(1Â 1Â 1) are analyzed by X-ray diffraction measurements, their surface morphologies by atomic force microscopy, and the optical properties are investigated by photoluminescence measurements. The improved crystallographic quality of GaN on Si(1Â 1Â 0) comes along with a more efficient effect of strain compensating interlayers in comparison to GaN layers on Si(1Â 1Â 1).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 312, Issue 2, 1 January 2010, Pages 180-184
Journal: Journal of Crystal Growth - Volume 312, Issue 2, 1 January 2010, Pages 180-184
نویسندگان
F. Reiher, A. Dadgar, J. Bläsing, M. Wieneke, A. Krost,