کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1795115 1023715 2008 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Boron phosphide as the buffer-layer for the epitaxial III-nitride growth: A theoretical study
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Boron phosphide as the buffer-layer for the epitaxial III-nitride growth: A theoretical study
چکیده انگلیسی

We present our preliminary results of a systematic theoretical study of the adsorption of N and Ga over boron phosphide (BP) (1 0 0) (2×1) surfaces. We have analyzed the changes in the bond lengths and bond angles before and after deposition. Based on our obtained results, we show that the N atom prefers to make bonds with the surface dimers, during the nitridation of the BP surfaces, which favors the growth of cubic GaN thin films. Over the B-terminated surfaces, the Ga atoms prefer to make bridges between two B-dimers, and the final structure of the GaN films tends to be hexagonal. At P-terminated surfaces, there is a competition between the Ga adsorption over the surface dimers, and over the empty sites of the surface. While the latter favors the formation of surface Ga droplets over this surface, the adsorption over the P-dimers can result in cubic GaN samples.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 310, Issue 17, 15 August 2008, Pages 3973–3978
نویسندگان
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