کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1795925 | 1524485 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Dislocation analysis in homoepitaxial GaInN/GaN light emitting diode growth
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We demonstrate homoepitaxial growth of GaInN/GaN-based light emitting diodes (LED) on quasi-bulk GaN with an atomically flat polished surface. The threading dislocation densities of the epitaxial layers were 2–5×108 cm−2 which was one order of magnitude less than those grown on c-plane sapphire substrate. The growth defects introduced during the epitaxial process were also one order of magnitude smaller than those grown on the sapphire substrate. The crystalline quality and the optical properties of the epitaxial layer and device performance were much improved. The optical output power of the light emitting diode increased by more than one order of magnitude compared to those on sapphire substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 298, January 2007, Pages 272–275
Journal: Journal of Crystal Growth - Volume 298, January 2007, Pages 272–275
نویسندگان
T. Detchprohm, Y. Xia, Y. Xi, M. Zhu, W. Zhao, Y. Li, E.F. Schubert, L. Liu, D. Tsvetkov, D. Hanser, C. Wetzel,