Micro-defects in Ge doped Czochralski grown Si crystals

With the reduction in size of the features of ultra large-scale integrated (ULSI) circuits, micro-defects such as voids in Czochralski (Cz) silicon (Si) crystals play more important roles in the reliability and yield of these devices. As one of the tetravalent atoms, the behavior of germanium (Ge) doped in Cz Si crystals has attracted considerable attention in recent years. In this presentation, recent processes in the study of voids in Ge doped Cz (GCZ) Si crystals are reviewed. The grown-in characteristics of voids in GCZ wafer, including flow pattern defects (FPDs) and crystal originated particles (COPs), suggested that Ge can suppress large voids resulting in denser and smaller voids. Meanwhile, it has been found that the density of voids can be decreased by Ge doping and they can be eliminated easily in GCZ Si crystals through high temperature annealing. It is therefore speculated that the gate oxide integrity (GOI) of semiconductor devices can be improved by Ge doping. The mechanism of the effect of Ge on voids is discussed to explain the experimental results.