کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1811365 | 1025593 | 2011 | 6 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Double carriers pulse DLTS for the characterization of electron–hole recombination process in GaAsN grown by chemical beam epitaxy Double carriers pulse DLTS for the characterization of electron–hole recombination process in GaAsN grown by chemical beam epitaxy](/preview/png/1811365.png)
A nitrogen-related electron trap (E1), located approximately 0.33 eV from the conduction band minimum of GaAsN grown by chemical beam epitaxy, was confirmed by investigating the dependence of its density with N concentration. This level exhibits a high capture cross section compared with that of native defects in GaAs. Its density increases significantly with N concentration, persists following post-thermal annealing, and was found to be quasi-uniformly distributed. These results indicate that E1 is a stable defect that is formed during growth to compensate for the tensile strain caused by N. Furthermore, E1 was confirmed to act as a recombination center by comparing its activation energy with that of the recombination current in the depletion region of the alloy. However, this technique cannot characterize the electron−hole (e–h) recombination process. For that, double carrier pulse deep level transient spectroscopy is used to confirm the non-radiative e–h recombination process through E1, to estimate the capture cross section of holes, and to evaluate the energy of multi-phonon emission. Furthermore, a configuration coordinate diagram is modeled based on the physical parameters of E1.
Research Highlights
► Double carrier pulse DLTS method confirms the existence of SRH center.
► The recombination center in GaAsN depends on nitrogen concentration.
► Minority carrier lifetime in GaAsN is less than 1 ns.
► A non-radiative recombination center exits in GaAsN.
Journal: Physica B: Condensed Matter - Volume 406, Issue 5, 1 March 2011, Pages 1070–1075