An application of gold diffusion for defect investigation in silicon

The application of gold diffusion for defect investigation in Si is illustrated by the diffusion experiments carried out on crystals containing grown-in or specially introduced defects. The efficiency of gold diffusion experiments for monitoring the concentration and spatial distribution of these defects is shown. The effect of vacancy type defects on gold diffusion is illustrated by investigations of nitrogen-doped FZ Si and of Cz Si after rapid thermal annealing. In both these cases the gold depth profile is distinctive for trap limited diffusion. The effect of sinks for self-interstitials on gold diffusion is illustrated by the results obtained on the plastically deformed Si. It is shown that in silicon deformed at relatively low temperatures the gold diffusion is to a great extent determined by the defects in the dislocation trails while in high temperature deformed Si the sinks for self-interstitials are associated with dislocations themselves.