کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
189481 459680 2011 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Reaction kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Reaction kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers
چکیده انگلیسی

The study of the kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers is presented. The model system was Pt submonolayer deposition on Au(1 1 1) via red-ox replacement of Pb and Cu UPD monolayers on Au(1 1 1). The kinetics of a single replacement reaction was studied using the formalism of the comprehensive analytical model developed to fit the open circuit potential transients from deposition experiments. The practical reaction kinetics parameters like reaction half life, reaction order and reaction rate constant are determined and discussed with their relevance to design and control of deposition experiments. The effects of transport limitation and the role of the anions/electrolyte on deposition kinetics are investigated and their significance to design of effective deposition process is discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 56, Issue 16, 30 June 2011, Pages 5545–5553
نویسندگان
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