کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
194035 | 459783 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Morphologic and crystallographic studies on electrochemically formed chromium nitride films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Morphologic and crystallographic studies on electrochemically formed chromium nitride films Morphologic and crystallographic studies on electrochemically formed chromium nitride films](/preview/png/194035.png)
چکیده انگلیسی
Chromium nitride films were prepared by anodically oxidizing nitride ions at 0.4–1.5 V versus Li+/Li on chromium substrates in molten LiCl–KCl–Li3N systems at 723 K. A crystalline Cr2N film was successfully prepared at 0.4–1.4 V, and was thicker at more positive electrolytic potential. At 1.5 V, a Cr–N film could be also obtained, but its growth rate was relatively low. The film prepared at 1.5 V consisted of two distinctive layers. The surface layer was amorphous Cr–N containing crystalline CrN particles, and the inner layer was crystalline CrN. It was considered the existence of the amorphous phase suppressed the film growth.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 53, Issue 1, 20 November 2007, Pages 122–126
Journal: Electrochimica Acta - Volume 53, Issue 1, 20 November 2007, Pages 122–126
نویسندگان
Koji Amezawa, Takuya Goto, Hiroyuki Tsujimura, Yoshiharu Uchimoto, Rika Hagiwara, Yoichi Tomii, Yasuhiko Ito,